SIC ICP maratási lemez

ICP etching (Inductively Coupled Plasma Etching) technology is a precision etching process in semiconductor manufacturing, commonly used for high-precision and high-quality pattern transfer, especially suitable for deep hole etching, micro-pattern processing, etc.

Veteksemicon's SiC ICP Etching Plate is specially designed for ICP process, using high-quality SiC materials, and can provide excellent performance in high temperature, strong corrosive and high energy environments. As a key component for bearing and supporting, ICP etch plate ensures stability and efficiency during the etching process.

SiC ICP Etching Plate Product Features

●  High temperature tolerance

SiC ICP Etching Plate can withstand temperature changes up to 1600°C, ensuring stable use in high temperature ICP etching environment and avoiding deformation or performance degradation caused by temperature fluctuations.

●  Excellent corrosion resistance

Silicon carbide material can effectively resist highly corrosive chemicals such as hydrogen fluoride, hydrogen chloride, sulfuric acid, etc. that may be exposed during etching, ensuring that the product is not damaged during long-term use.

●  Low thermal expansion coefficient

SiC ICP Etching Plate has a low thermal expansion coefficient, which can maintain good dimensional stability in high temperature environment, reduce stress and deformation caused by temperature changes, and ensure accurate etching process.

●  High hardness and wear resistance

SiC has a hardness of up to 9 Mohs hardness, which can effectively prevent mechanical wear that may occur during the etching process, extend service life, and reduce replacement frequency.

●  Excellent thermal conductivity

Excellent thermal conductivity ensures that the SiC tray can quickly dissipate heat during the etching process, avoiding local temperature increases caused by heat accumulation, thereby ensuring the stability and uniformity of the etching process.

With the support of a strong technical team, Veteksemicon SiC ICP Etching tray has completed various difficult projects and provides customized products according to your needs. We are looking forward to your inquiry.

Basic physical properties of CVD SiC: